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Thermodynamic analysis of preparation processes for boron-containing films with the use of N-trimethylborazine and hydrogen
A. A. Titov, A. N. Golubenko, M. L. Kosinova and F. A. Kuznetsov Russian Journal of Physical Chemistry A 84(11) 1891 (2010) https://doi.org/10.1134/S0036024410110129
Thermodynamic modeling of BC x N y chemical vapor deposition from mixtures of N-trimethylborazine and nitrogen
Bonding characteristics of DC magnetron sputtered B–C–N thin films investigated by Fourier-transformed infrared spectroscopy and X-ray photoelectron spectroscopy