| Issue |
J. Phys. IV France
Volume 104, March 2003
|
|
|---|---|---|
| Page(s) | 235 - 238 | |
| DOI | https://doi.org/10.1051/jp4:200300069 | |
J. Phys. IV France 104 (2003) 235
DOI: 10.1051/jp4:200300069
High-resolution X-ray microbeam by using a Kirkpatrik-BaezType mirror at SPring-8
A. Takeuchi, Y. Suzuk and H. TakanoJASRI/SPring-8, Kouto 1-1-1, Mikazuki, Sayo, Hyogo 679-5198, Japan
Abstract
X-ray microbeam generated by a Kirkpatrik-Baez (KB) mirror optics with a set of two parabolic-shaped reflective
surfaces was tested at an undulator beamline BL47XU of SPring-8. The KB mirror used in the experiment was fabricated by
numerically-controlled polishing technique at Cannon Co. Ltd. Measured focal spot size at the x-ray energy of 8 keV in the
vertical and the horizontal were 0.75
m and 0.32
m, respectively. The photon flux of the focal spot was
[photons/
s/100 mA ring current]. Tantalum test pattern of the 0.2
m line width was clearly observed with raster scan.
© EDP Sciences 2003