| Issue |
J. Phys. IV France
Volume 11, Number PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|---|---|---|
| Page(s) | Pr3-629 - Pr3-635 | |
| DOI | https://doi.org/10.1051/jp4:2001380 | |
J. Phys. IV France 11 (2001) Pr3-629-Pr3-635
DOI: 10.1051/jp4:2001380
CVD deposition of cobalt oxide (CO3O4) from Co(acac)2
E. Fischer Rivera, B. Atakan and K. Kohse-HöinghausPhysikalische Chemie I, Fakultät für Chemie, Universität Bielefeld, Universitätsstr. 25, 33615 Bielefeld, Germany
Abstract
Cobalt oxides are interesting materials for catalytic applications. Their deposition by CVD methods, however, have been rarely studied to date. In this work, cobalt(II)-acetylacetonate, Co(acac)2, was used as metal-organic precursor together with oxygen, to deposit Co3O4 on steel and silicon dioxide substrates in an atmospheric cold-wall CVD reactor. The morphology and growth rate as a function of temperature, flow rate and oxygen partial pressure was studied. Growth was found between 200 and 500 °C. The samples were analysed by SEM, UV-Vis spectroscopy and XRD. The morphology as well as the growth rate may be varied in a wide parameter range from smooth films to dendritic growth. Some samples were also tested for their catalytic activity in propane oxidation.
© EDP Sciences 2001