| Issue |
J. Phys. IV France
Volume 11, Number PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|
|---|---|---|
| Page(s) | Pr3-1191 - Pr3-1196 | |
| DOI | https://doi.org/10.1051/jp4:20013150 | |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-1191-Pr3-1196
DOI: 10.1051/jp4:20013150
1 Institute of Physical Chemistry, NCSR Demokritos, 15310 Aghia Paraskevi, Attikis, Greece
2 Institute of Microelectronics, NCSR Demokritos, 15310 Aghia Paraskevi, Attikis, Greece
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-1191-Pr3-1196
DOI: 10.1051/jp4:20013150
CVD modifications of porous Vycor silica for gas separation and sensor applications
E. Magoulianti1, K. Beltsios1, D. Davazoglou2 and N. Kanellopoulos11 Institute of Physical Chemistry, NCSR Demokritos, 15310 Aghia Paraskevi, Attikis, Greece
2 Institute of Microelectronics, NCSR Demokritos, 15310 Aghia Paraskevi, Attikis, Greece
Abstract
The work reviews approaches for the CVD-modification of Vycor silica tubes beyond the widely exposed method of plain asymmetric pore blocking. Both currently pursued routes as well as potential future approaches are described. The presentation covers the asymmetric narrowing of pores, the uniform but limited -in-degree deposition, the formation of double pore networks and the template approach. Modifications aim at the generation of membranes appropriate for gas and/or vapor separation or sensor applications.
© EDP Sciences 2001