J. Phys. IV France
Volume 11, Number PR2, Juillet 2001X-Ray Lasers 2000
|Page(s)||Pr2-605 - Pr2-608|
J. Phys. IV France 11 (2001) Pr2-605-Pr2-608
Ultrafast hollow cathode triggered capillary discharge device as a strong XUV sourceI. Krisch1, P. Choi2, J. Larour2 and J. Rous2
1 John Caunt Scientific Ltd., Oxford Ox2 6YE, U.K.
2 Laboratoire de Physique des Milieux Ionisés, UMR 7648 du CNRS, École Polytechnique, 91128 Palaiseau, France
Several modifications of ultrafast capillary discharge devices have been operated in 3 gases (Xenon, Argon, Methane) at low pressure to obtain XUV radiation. Combining the features of a transient hollow cathode discharge with the inherent characteristics of the capillary discharge leads to a new starting regime different from the standard one. An electron beam being supported by the Hollow Cathode Effect makes the discharge initiating on-axis without any pollution by wall material. The capillary acts only as a limiter. After initiation, the heating process finishes within one ns time scale. Using a stored energy of less than 0.5 J, we achieve plasma temperatures higher than 80eV. With respect to future applications, our table top device gives the edge on other systems like laser produced plasmas or synchrotons through compacity, simplicity and cost effectiveness. With respect to basic research, we are close to the lasing conditions of the recombination scheme. We report on the electric parameters, the spatial and temporal development of the emitting source and the time-resolved XUV-spectroscopy including radiance analysis.
© EDP Sciences 2001