Issue
J. Phys. IV France
Volume 10, Number PR5, March 2000
The 1999 International Conference on Strongly Coupled Coulomb Systems
Page(s) Pr5-199 - Pr5-202
DOI https://doi.org/10.1051/jp4:2000533
The 1999 International Conference on Strongly Coupled Coulomb Systems

J. Phys. IV France 10 (2000) Pr5-199-Pr5-202

DOI: 10.1051/jp4:2000533

Electronic correlations in real and model plasmas

I.M. Tkachenko1, 2, J. Alcober1 and Fernández de Córdoba1

1  Department of Applied Mathematics, Polytechnic University, 46022 Valencia, Spain
2  Mediterranean University Center of Science and Technology, 46022 Valencia, Spain


Abstract
Self-consistent calculations of dense real and model plasma static characteristics are reported. The inclusion of the effective model potential improves the coherence of the results.



© EDP Sciences 2000