Deposition of nanoscale rhodium dots by STM assisted CVD

F. Marchi; D. Tonneau; R. Pierrisnard; V. Bouchiat; V. Safarov; H. Dallaporta; P. Doppelt; R. Even

doi:doi:10.1051/jp4:1999892

Issue		J. Phys. IV France Volume 09, Number PR8, September 1999 Proceedings of the Twelfth European Conference on Chemical Vapour Deposition


Page(s)		Pr8-733 - Pr8-739
DOI		https://doi.org/10.1051/jp4:1999892

Proceedings of the Twelfth European Conference on Chemical Vapour Deposition

J. Phys. IV France 09 (1999) Pr8-733-Pr8-739
DOI: 10.1051/jp4:1999892

Deposition of nanoscale rhodium dots by STM assisted CVD

F. Marchi¹, D. Tonneau¹, R. Pierrisnard¹, V. Bouchiat¹, V. Safarov¹, H. Dallaporta¹, P. Doppelt² and R. Even²

¹ Faculté des Sciences de Luminy, Département de Physique, 13288 Marseille cedex 09, France
² ESPCI, 10 rue Vauquelin, 75231 Paris, France

Abstract
Direct patterning of nanometric metallic features is possible by local decomposition of gaseous molecules on a surface, induced by application of a pulse voltage on a STM tip while surface imaging. Decomposition reaction occurs above a threshold voltage of 2.7 V corresponding to an electric field of about 5.4 10⁷ V.cm^-1 between STM tip and sample. Metallic Rhodium dots as small as 3 nm can be deposited using this method. The kinetics of formation of these dots are discussed and a reaction mechanism is proposed.