| Issue |
J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | Pr8-493 - Pr8-499 | |
| DOI | https://doi.org/10.1051/jp4:1999862 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-493-Pr8-499
DOI: 10.1051/jp4:1999862
1 Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
2 Laboratory of Corrosion and Materials Chemistry, Helsinki University of Technology, P.O. Box 6200, 02015 Espoo, Finland
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-493-Pr8-499
DOI: 10.1051/jp4:1999862
Atomic layer deposited thin films for corrosion protection
R. Matero1, M. Ritala1, M. Leskelä1, T. Salo2, J. Aromaa2 and O. Forsén21 Department of Chemistry, University of Helsinki, P.O. Box 55, 00014 Helsinki, Finland
2 Laboratory of Corrosion and Materials Chemistry, Helsinki University of Technology, P.O. Box 6200, 02015 Espoo, Finland
Abstract
The suitability of Atomic Layer Deposition for making corrosion protection coatings was examined. Thin films of Al2O3, TiO2, Ta2O5 and Al2O3-TiO2 multilayer were deposited on stainless steel substrates. The films were deposited at 150-400 °C. The corrosion behaviour of the samples was studied by Electrochemical Impedance Spectroscopy in 3.5 wt.% NaCl and 0.1 and 1 mol/l HCl solutions. Al2O3 was found to protect the substrate material against corrosion for a limited time in NaCl. TiO2 alone does not give good protection, but when combined with Al2O3 in a multilayer structure better protection is achieved. Ta2O5 films were tested in HCl and were found to protect the base material to some extent.
© EDP Sciences 1999