Issue |
J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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Page(s) | Pr8-1099 - Pr8-1106 | |
DOI | https://doi.org/10.1051/jp4:19998137 |
J. Phys. IV France 09 (1999) Pr8-1099-Pr8-1106
DOI: 10.1051/jp4:19998137
Composition and magnetic properties of MOCVD processed thin films from nickelocene
D. de Caro1, L. Brissonneau2, D. Boursier3, R. Madar3 and C. Vahlas21 Laboratoire de Chimie de Coordination, CNRS, 205 route de Narbonne, 31077 Toulouse cedex 4, France
2 Laboratoire Interfaces et Matériaux, INPT-CNRS, École Nationale Supérieure de Chimie de Toulouse, 118 route de Narbonne, 31077 Toulouse cedex 4, France
3 Laboratoire de Matériaux et du Génie Physique, INPG-CNRS, École Nationale Supérieure de Physique de Grenoble, BP. 46, 38402 Saint-Martin-d'Hères, France
Abstract
In this study, results are reported on the composition and the electrical and magnetic properties of thin films of nickel deposited by MOCVD from nickelocene. It was found that films contain carbon, whose content decreases with increasing deposition pressure. Part of the carbon atoms are found in interstitial position in the Ni lattice. Saturation magnetization, Curie temperature and electrical conductivity of the films decrease with increasing their carbon content. The evolution of the magnetization saturation Ms of the films with temperature follows Bloch's law. The different forms, namely carbidic (interstitial), aliphatic, or cyclic, in which carbon is found are discussed, and are correlated with the variations of the properties of the films.
© EDP Sciences 1999