| Issue |
J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | Pr8-869 - Pr8-876 | |
| DOI | https://doi.org/10.1051/jp4:19998109 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-869-Pr8-876
DOI: 10.1051/jp4:19998109
Research Department of Bronkhorst High-Tech B.V., Nijverheidsstraat 1A, 7261 AK Ruurlo, The Netherlands
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-869-Pr8-876
DOI: 10.1051/jp4:19998109
Precision mass flow metering for CVD applications
H.J. BoerResearch Department of Bronkhorst High-Tech B.V., Nijverheidsstraat 1A, 7261 AK Ruurlo, The Netherlands
Abstract
Mass flow instruments play an important role in every CVD application. This paper will describe the basic characteristics of thermal mass flow metering and controlling of gases and liquids. The essential theoretical background will be given as well as information provided by the leading manufacturer in Europe. Also some practical uses of the instruments in CVD applications will be highlighted. With high accuracy and very good reproducibility the instruments are very well suited for the key role of controlling the fluids (gases and liquids) in CVD applications.
© EDP Sciences 1999