J. Phys. IV France
Volume 05, Number C5, Juin 1995Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|Page(s)||C5-489 - C5-496|
J. Phys. IV France 05 (1995) C5-489-C5-496
MO CVD of Noble MetalsI.K. Igumenov
Institute of Inorganic Chemistry, Lavrentieva 3, 630090 Novosibirsk, Russia
The state of the art in research and application of processes of chemical vapour deposition of noble metal (Pt, Pd, Rh, Ir, Ru, Au) coatings is considered. Systematization of known experimental data on synthesis, thermal properties and saturated vapour pressure of volatile compounds of noble metals with organic ligands is provided. The processes of CVD of noble metals were analized from general requirements to precursors. It is shown that chelate or mixed-ligand noble metal complexes and, in particular [MATH]-diketonate derivatives due to their thermal properties are the most suitable for deposition of noble metal thick films.
© EDP Sciences 1995