Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-327-C2-334
DOI: 10.1051/jp4:1991240

COMPARATIVE STUDY OF Ge_xC_x-1 FILMS PREPARED BY MOCVD FROM TETRAETHYLGERMANIUM AND TETRAVINYLGERMANIUM

M'B. AMJOUD¹, A. REYNES¹, R. MORANCHO¹, P. MAZEROLLES² and R. CARLES<sup>3

1</sup>  Laboratoire des Matériaux (URA 445 CNRS), Institut National Polytechnique de Toulouse (E.N.S.C.T), 118 route de Narbonne, F-31077 Toulouse cedex, France
²  Laboratoire des Organométalliques (URA 477 CNRS), Université Paul Sabatier, 118 route de Narbonne, F-31062 Toulouse cedex, France
³  Laboratoire de Physique des Solides (URA 077 CNRS), Université Paul Sabatier, 118 route de Narbonne, F-31062 Toulouse cedex, France

Abstract
The coatings coming from the thermal decomposition of two organogermanium compounds GeR₄ where R is either .C₂H₅ or .CH=CH₂ have been investigated by various technics. According to the starting molecule and the experimental conditions, the films diplay different features. For example the pyrolysis of Ge (CH=CH₂)₄ leads to the formation of a Ge-C, C-C and Ge-Ge bonds while the pyrolysis of Ge (C₂H₅)₄ gives Ge-Ge and few C-C bonds.

© EDP Sciences 1991