Issue
J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
Page(s) Pr8-923 - Pr8-928
DOI https://doi.org/10.1051/jp4:19998116
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition

J. Phys. IV France 09 (1999) Pr8-923-Pr8-928

DOI: 10.1051/jp4:19998116

Silver pivalate as a new volatile precursor for thin film deposition

N. Kuzmina1, S. Paramonov1, R. Ivanov1, V. Kezko2, K. Polamo3 and S. Troyanov1

1  Moscow State University, Department of Chemistry, Leninskie Gory, 119899 Moscow, Russia
2  Kumakov Institute of General and Inorganic Chemistry, 117234 Moscow, Russia
3  Planar International Ltd., Olarinluoma 9, P.O. Box 46, 02201 Espoo, Finland


Abstract
to search a new volatile silver(I) precursor, the AgPiv complex (HPiv - 2,2-dimethylpropionic acid) has been prepared and characterized by elemental and TG analysis. Complex AgPiv is moisture stable and has rather low light sensitivity. An X-ray structure determination showed that the crystal structure of AgPiv consists of dimers, connected with each other by bridging Ag-O bonds. In addition, there are Ag...Ag contacts within dimers and between polymeric chains. It was found that AgPiv can be sublimed under dynamic vacuum (0.01-0.03 torr) at 230-250°C. The ALE experiments on SrS:Ag thin film growth were conducted with the use of AgPiv as volatile precursor.



© EDP Sciences 1999

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