J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
Page(s) Pr8-923 - Pr8-928
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition

J. Phys. IV France 09 (1999) Pr8-923-Pr8-928

DOI: 10.1051/jp4:19998116

Silver pivalate as a new volatile precursor for thin film deposition

N. Kuzmina1, S. Paramonov1, R. Ivanov1, V. Kezko2, K. Polamo3 and S. Troyanov1

1  Moscow State University, Department of Chemistry, Leninskie Gory, 119899 Moscow, Russia
2  Kumakov Institute of General and Inorganic Chemistry, 117234 Moscow, Russia
3  Planar International Ltd., Olarinluoma 9, P.O. Box 46, 02201 Espoo, Finland

to search a new volatile silver(I) precursor, the AgPiv complex (HPiv - 2,2-dimethylpropionic acid) has been prepared and characterized by elemental and TG analysis. Complex AgPiv is moisture stable and has rather low light sensitivity. An X-ray structure determination showed that the crystal structure of AgPiv consists of dimers, connected with each other by bridging Ag-O bonds. In addition, there are Ag...Ag contacts within dimers and between polymeric chains. It was found that AgPiv can be sublimed under dynamic vacuum (0.01-0.03 torr) at 230-250°C. The ALE experiments on SrS:Ag thin film growth were conducted with the use of AgPiv as volatile precursor.

© EDP Sciences 1999

Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.

Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.

Initial download of the metrics may take a while.