Low Temperature Deposition of TiN Ceramic Material by Metal Organic and/or Plasma Enhanced CVD C. I.M.A. Spee, J. P.A.M. Driessen et A. D. KuypersJ. Phys. IV France, 05 C5 (1995) C5-719-C5-734DOI: https://doi.org/10.1051/jphyscol:1995587
