A New Route to the Deposition of Al2O3 by MOCVD A. C. Jones, D. J. Houlton, S. A. Rushworth et G. W. CritchlowJ. Phys. IV France, 05 C5 (1995) C5-557-C5-560DOI: https://doi.org/10.1051/jphyscol:1995566
