Deposition by an aerosol assisted MOCVD process of Eu or Er doped Y2O3-P2O5 thin films J. L. Deschanvres et W. MeffreJ. Phys. IV France, 11 PR3 (2001) Pr3-653-Pr3-660DOI: https://doi.org/10.1051/jp4:2001383
