Low pressure CVD of transparent Cu-Al-O and Cu-Ti-O thin films D. Barreca, G. A. Battiston, U. Casellato, R. Gerbasi et E. TondelloJ. Phys. IV France, 11 PR11 (2001) Pr11-253-Pr11-260DOI: https://doi.org/10.1051/jp4:20011141
