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Observations of hybrid coupling modes and non-local ionization in an RF plasma source with non-uniform magnetic fields
A. Caldarelli, R. Andriulli, R. W. Boswell, C. Charles, K. Takahashi and F. Ponti Physics of Plasmas 33(5) (2026) https://doi.org/10.1063/5.0314642
Plasma coupling mode transition in a low-power decoupled magnetic nozzle device
R Andriulli, A Caldarelli, C Charles, R W Boswell, F Ponti and N Rattenbury Plasma Sources Science and Technology 34(10) 105007 (2025) https://doi.org/10.1088/1361-6595/ae0bf2
Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma
You He, Yi-Lang Jiang, Myoung-Jae Lee, Beom-Jun Seo, Ju-Ho Kim and Chin-Wook Chung Journal of Vacuum Science & Technology A 42(6) (2024) https://doi.org/10.1116/6.0003874
Low temperature epitaxial technology for GaN-based materials
Gallium Nitride Film Growth Using a Plasma Based Migration Enhanced Afterglow Chemical Vapor Deposition System
K. Scott A. Butcher, Brad W. Kemp, Ilian B. Hristov, et al. Japanese Journal of Applied Physics 51(1) 01AF02 (2012) https://doi.org/10.1143/JJAP.51.01AF02
InN grown by migration enhanced afterglow (MEAglow)
RF‐Ionised Physical Vapour Deposition for Cu Thin Films: Deposition on Polymer Substrate
Ismael Guesmi, Ludovic de Poucques, Lionel Teule‐Gay, Jean Bretagne and Caroline Boisse‐Laporte Plasma Processes and Polymers 6(S1) (2009) https://doi.org/10.1002/ppap.200930808
Two-dimensional equilibrium of a low temperature magnetized plasma