Numéro
J. Phys. IV France
Volume 125, June 2005
Page(s) 93 - 96
DOI https://doi.org/10.1051/jp4:2005125021


J. Phys. IV France 125 (2005) 93-96

DOI: 10.1051/jp4:2005125021

Photoreflectance characterization of functionally graded materials. Application to diffusion process analysis

J. Jumel1, D. Rochais2 and F. Lepoutre3

1  LMT Cachan, 61 avenue du Président Wilson, 94235 Cachan Cedex, France
2  CEA Le Ripault, BP. 16, 37260 Monts, France
3  ONERA/DMSE/MECS, BP. 72, 29 avenue de la Division Leclerc, 92322 Châtillon Cedex, France


Abstract
Samples made of two slabs respectively of Cu and Zn are heat treated to create concentration gradient, and consequently a thermal properties gradient. Photoreflectance microscopy is used to image these samples with a microscopic resolution. The observed thermal contrast is used to evaluate the distribution of thermal diffusivity.



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