Numéro
J. Phys. IV France
Volume 11, Numéro PR11, Décembre 2001
International Conference on Thin Film Deposition of Oxide Multilayers Hybrid Structures
Page(s) Pr11-85 - Pr11-90
DOI https://doi.org/10.1051/jp4:20011113
International Conference on Thin Film Deposition of Oxide Multilayers Hybrid Structures

J. Phys. IV France 11 (2001) Pr11-85-Pr11-90

DOI: 10.1051/jp4:20011113

Vanadium pentoxide thin films deposited by atomic layer deposition: A model electrode for investigating the structural changes induced by lithium intercalation

R. Baddour-Hadjean1, V. Golabkan1, J.P. Pereira-Ramos2, A. Mantoux2 and D. Lincot3

1  LADIR, UMR 7075 du CNRS-Paris VI, 2 rue Henri Dunant, 94320 Thiais, France
2  LECSO, UMR 7582 du CNRS-Paris XII, 2 rue Henri Dunant, 94320 Thiais, France
3  LECA, UMR 7574, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris, France


Abstract
Micro-Raman spectrometry has been applied to the characterization of the structural changes induced by lithium accomodation in V2O5 thin films prepared by Atomic Layer Deposition. The good homogeneity and cristallinity of the films has allowed to obtain high resolution Raman spectra and to follow their transformation as lithium electrochemical insertion proceeds in V2O5 cathodic films. New informations on the vibrational fingerprints of the different lithiated phases are reported here up to a lithium content of 1.4 Li/V2O5.



© EDP Sciences 2001