Numéro |
J. Phys. IV France
Volume 10, Numéro PR5, March 2000
The 1999 International Conference on Strongly Coupled Coulomb Systems
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Page(s) | Pr5-209 - Pr5-214 | |
DOI | https://doi.org/10.1051/jp4:2000535 |
The 1999 International Conference on Strongly Coupled Coulomb Systems
J. Phys. IV France 10 (2000) Pr5-209-Pr5-214
DOI: 10.1051/jp4:2000535
Institute for Plasma Research, University of Maryland, College Park, Maryland 20742, U.S.A.
© EDP Sciences 2000
J. Phys. IV France 10 (2000) Pr5-209-Pr5-214
DOI: 10.1051/jp4:2000535
Electrical conductivity measurement in dense metal plasmas : Comparisons of several metals
A.W. DeSilva and J.D. KatsourosInstitute for Plasma Research, University of Maryland, College Park, Maryland 20742, U.S.A.
Abstract
We measure the electrical conductivity of strongly coupled metal plasmas in the temperature range 8-30 kK, in a density range from about 1/2 solid density down to about 10-3 times solid density. Plasma density is deduced from streak photography, and temperature deduced from energy input, using the LANL SESAME database. The results are compared with theoretical predictions of several authors. When conductivity is plotted vs. atom density, very little difference is seen between aluminium. iron, nickel, copper and tungsten plasmas.
© EDP Sciences 2000