Numéro
J. Phys. IV France
Volume 04, Numéro C7, Juillet 1994
8th International Topical Meeting on Photoacoustic and Photothermal Phenomena
8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique
Page(s) C7-611 - C7-614
DOI https://doi.org/10.1051/jp4:19947144
8th International Topical Meeting on Photoacoustic and Photothermal Phenomena
8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique

J. Phys. IV France 04 (1994) C7-611-C7-614

DOI: 10.1051/jp4:19947144

Micrometer resolved inspection of defects and laser damage sites in UV high-reflecting coatings by photothermal displacement microscopy

A. Bodemann1, N. Kaiser1, M. Reichling2 and E. Welsch3

1  Fraunhofer-Einrichtung für Angewandte Optik und Feinmechanik, Schillerstrasse 1, 07745 Jena, Germany
2  Fachbereich Physik, Freie Universität Berlin, Arnimallee 14, 14195 Berlin, Germany
3  Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena, Germany


Abstract
Characteristic features of defects in dielectric multilayer UV-mirrors are determined by photothermal displacement imaging. A large number of micron sized absorbing defects are detected, however, their size and absorption strength distribution strongly depends on thin film preparation conditions. It is found that all features well correlate with thin film damage thresholds at 248nm. An enhanced photothermal amplitude in a halo around ablation spots damaged by high fluence UV light indicates thin film delamination resulting from thermoelastic stress during laser irradiation.



© EDP Sciences 1994