J. Phys. IV France 03 (1993) C8-337-C8-340
X-ray reflectivity and non-specular scattering investigation of amorphous W/Si multilayers after rapid thermal annealingM. JERGEL, E. MAJKOVÁ and S. LUBY
Institute of Physics, Slovak Academy of Sciences, Dúbravská cesta 9, 842 28 Bratislava, Slovakia
The specular reflectivity and non-specular scattering measurements at grazing incidence were used to characterize the evolution of the amorphous W/Si multilayer structure with the nominal period of 7 nm after the rapid thermal annealing. No mixing or interdiffusion worsening the perfection of the interfaces takes place up to the 773K/5s annealing. The complex interface phenomena start after the 773K/20s annealing connected with the displacement and coarsening of the interfaces. After the 1023K/5s annealing the ML structure collapsed.
© EDP Sciences 1993