Troisiéme Conférence Européenne sur les Matériaux et les Procédés Avancés
J. Phys. IV France 03 (1993) C7-1069-C7-1072
Stability and formation kinetics of TiN and silicides in the Ti/Si3N4 diffusion coupleM. PAULASTO1, F.J.J. VAN LOO2 and J.K. KIVILAHTI1
1 Helsinki University of Technology, Dept. of Materials Science and Technology, 02150 Espoo, Finland
2 On leave from Technical University of Eindhoven, Lab. of Solid State Chemistry and Materials Science, 5600 MB Eindhoven, The Netherlands
Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200°C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria.
© EDP Sciences 1993