J. Phys. IV France 02 (1991) C2-897-C2-901
MICROENGINEERING - THE NEW APPLICATION OF CHEMICAL VAPOR DEPOSITIONP.B. GRABIEC and J.M. LYSKO
Inst. of Electron Technology, al. Lotnikow 32/46, 02-668 Warsaw, Poland
Techniques of Chemical Vapour Deposition, developed primarily for VLSI Circuits fabrication, enriched by the experience of CVD methods utilized in the field of hard wear resistant coatings and other mechanical related application, are the versatile tools enabling creation of complex, 3-dimensional microstructures required for development of micromechanical devices - sensors and actuators. In this paper the application of CVD methods for fabrication of micromechanic and other transducers technologically microelectronic compatible is discussed. An example of capacitive pressure sensor which can be integrated with CMOS devices is presented.
© EDP Sciences 1991