| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | C5-567 - C5-582 | |
| DOI | https://doi.org/10.1051/jphyscol:1995568 | |
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
J. Phys. IV France 05 (1995) C5-567-C5-582
DOI: 10.1051/jphyscol:1995568
Department of Electronic Material Technology, St.-Petersburg State Technical University, Polytechnical Str. 29, St.-Petersburg 195 251, Russia
© EDP Sciences 1995
J. Phys. IV France 05 (1995) C5-567-C5-582
DOI: 10.1051/jphyscol:1995568
Remote PECVD : a Route to Controllable Plasma Deposition
S.E. AlexandrovDepartment of Electronic Material Technology, St.-Petersburg State Technical University, Polytechnical Str. 29, St.-Petersburg 195 251, Russia
Abstract
Some aspects of RF remote plasma enhanced CVD including the main features of the technique, possibilities of overcoming disadvantages typical for conventional plasma processes, and possible directions to improve the remote plasma method are discussed.
© EDP Sciences 1995