Studies of the Oxidation Mechanism of Yttrium Implanted Chromium Using XAFS and GAXRD

P.N. Gibson; M.J. Cristóbal; M.F. Stroosnijder

doi:doi:10.1051/jp4:19972195

Numéro		J. Phys. IV France Volume 7, Numéro C2, Avril 1997 Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure


Page(s)		C2-1205 - C2-1206
DOI		https://doi.org/10.1051/jp4:19972195

Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure

J. Phys. IV France 7 (1997) C2-1205-C2-1206
DOI: 10.1051/jp4:19972195

Studies of the Oxidation Mechanism of Yttrium Implanted Chromium Using XAFS and GAXRD

P.N. Gibson, M.J. Cristóbal and M.F. Stroosnijder

Institute for Advanced Materials (Ispra Site) Joint Research Centre of the European Commission, 21020 Ispra (VA), Italy

Abstract
The first stages of the oxidation of yttrium implanted chromium have been examined using EXAFS at the yttrium and chromium K-edges. Initially a thin chromia layer forms on the surface, and the implanted yttrium rapidly oxidises to form nanocrystallites of yttria. Upon further oxidation some yttrium is incorporated into the chromia scale, probably at the grain boundaries. The local atomic structure around these yttrium ions resembles that of YCrO₄.