J. Phys. IV France
Volume 133, June 2006
Page(s) 1213 - 1215
Publié en ligne 16 juin 2006
Inertial Fusion Sciences and Applications 2005
J.-C. Gauthier, et al.
J. Phys. IV France 133 (2006) 1213-1215

DOI: 10.1051/jp4:2006133249

Ablation of transparent materials by high intensity and ultrashort laser pulses

I.N. Zavestovskaya

Lebedev Physical Institute, 119991 Moscow, Russia

The processes of nonlinear absorption is considered in transparent materials like nitride semiconductor, sapphire and others transparent dielectrics under ultrashort (fs-range) laser pulses irradiation. The ablation threshold is in multi-TW/cm2 range. The power consumption under the ablation process is described in terms of the tunneling absorption. It is derived the ablation threshold increases as about third power of the energy bandgap of the material, in close agreement with experimental data.

© EDP Sciences 2006