Accès gratuit
J. Phys. IV France
Volume 127, June 2005
Page(s) 63 - 68

J. Phys. IV France 127 (2005) 63-68

DOI: 10.1051/jp4:2005127010

Microscopie interférentielle X-UV de plasmas créés par laser

O. Guilbaud1, H. Tang1, D. Joyeux2, G. Jamelot1, A. Klisnick1, D. Ros1, D. Phalippou2, K. Cassou1, M. Kado3, M. Nishikino3, K. Sukegawa3, M. Kishimoto3, M. Ishino3, K. Nagashima3 and H. Daido3

1  LIXAM, Bât. 350, Université Paris-Sud, 91405 Orsay Cedex, France
2  LCFIO, Institut d'Optique, Bât. 503, Campus d'Orsay, 91403 Orsay Cedex, France
3  Advanced Photon Research Center, Kansai Research Establishment, JAERI, 8-1 Umemidai, Kizu, Souraku, Kyoto 619-0215, Japan

The X-UV interferometry is a promising tools for plasma electron density measurement. We report on the results of such a plasma interferometry experiment using a soft x-ray laser as a probing beam ( $\lambda\,{=}\,13.9$ nm) and a new X-UV interference microscope. This device is a wavefront division interferometer coupled to a high resolution aspherical imaging mirror. Laser produced plasma electron density profiles were investigated at density as high as 1020 cm-3. The expanding plasma has been probed at different times of its evolution. Several nanosecond after its production, the plasma exhibits an index of refraction that is no more below one as expected for a pure plasma. The contribution of the bound electrons of plasma ions to the refractive index is discussed for that situation.

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