J. Phys. IV France
Volume 125, June 2005
Page(s) 593 - 596

J. Phys. IV France 125 (2005) 593-596

DOI: 10.1051/jp4:2005125136

Kinetics of the drying process of an anti-adherent coating using Photothermal Radiometry and Micro-Raman

D.M. Hurtado-Castañeda1, 2, J. Fernández1, 2, R. Velázquez1, 2, M. Estévez2, S. Vargas2, R. Rodríguez2 and M.E. Rodríguez2

1  Instituto Tecnológico de Querétaro, Av. Tecnológico s/n, Querétaro, Qro. Mexico
2  Centro de Física Aplicada y Tecnología Avanzada, UNAM, Juriquilla, Querétaro, Qro. Mexico

The kinetics of the drying process of a new anti-adherent (anti-graffiti) polymeric coating containing organic solvent was determined using Photothermal Radiometry (PTR) and Micro-Raman ($\mu$-R) Spectroscopy. PTR Spectroscopy was used to study, in real time, the kinetics of the drying process in samples protected with coatings with and without anti-adherent molecules. These were applied on a metal and silicon substrates. The PTR spectrum for coating without anti-adherent, shows a single relaxation time, while for coating containing anti-adherent shows two relaxation times corresponding to two different mechanisms: the solvent evaporation and the molecular re-arrangements of the two different molecular species present in the coating; the kinetic of the solvent evaporation is strongly dependent, as expected, on the solvent concentration.

© EDP Sciences 2005