J. Phys. IV France
Volume 104, March 2003
Page(s) 153 - 156

J. Phys. IV France
104 (2003) 153
DOI: 10.1051/jp4:200300051

Imaging of a laser plasma source at 13 nm wavelength approaching submicrometer resolution

R. Früke, T. Wilhein, M. Wieland and U. Vogt

RheinAhrCampus Remagen, University of Applied Sciences, Südallee 2, 53424 Remagen, Germany

Radiation in the extreme ultraviolet (EUV) spectral range is of interest for lithography and microscopy. Laser produced plasmas are sources for this kind of radiation. For successful usage it is necessary to study the source properties like size, stability and emitted spectra. For the spatial characterization of such a source a beamline was built up. The source was imaged at 13, 15 and 17 nm wavelength and at different laser energies with a resolution of better than 2 $\mu$m. As target material ethanol was used which was excited by a frequency-doubled Nd:YAG laser ( $\lambda = 532$ nm; 3 ns, 30 Hz). The source was mapped with a zone plate (KZP5: d = 2500 $\mu$m, $\Delta{\rm r_n}=0,523$ $\mu$m). With a magnification of 61 the images were taken with a thinned back-illuminated CCD. Additionally a periodic structure was mapped with micrometer resolution, too.

© EDP Sciences 2003