J. Phys. IV France
Volume 104, March 2003
Page(s) 99 - 102

J. Phys. IV France
104 (2003) 99
DOI: 10.1051/jp4:200300038

High lateral resolution spectroscopic imaging of surfaces: The undulator beamline "nanospectroscopy" at Elettra

A. Locatelli1, A. Bianco1, D. Cocco1, S. Cherifi1, S. Heun1, M. Marsi1, M. Pasqualetto1 and E. Bauer2

1  Sincrotrone Trieste S.C.p.A., S.S. 14 - Km 163.5 in Area Science Park, 34012 Basovizza, Trieste, Italy
2  Department of Physics and Astronomy, Arizona State University, Tempe, AZ 85287-1504, U.S.A.

High lateral resolution direct imaging of surfaces with chemical sensitivity is of increasing importance for basic and applied research in the field of surface and materials science. A novel and versatile beamline, to be employed for the spectromicroscopic study of surfaces in the submicron range, is now available at Elettra. The beamline, named "Nanospectroscopy", serves an end-station equipped with a Spectroscopic Photo-Emission and Low Energy Electron Microscope (SPELEEM). This microscope combines the ability to perform XPEEM (X-ray Photo-Emission Electron Microscopy), small spot XPS (X-ray Photoelectron Spectroscopy), XPD (X-ray Photoelectron Diffraction), LEEM and LEED (Low Energy Electron Microscopy and Diffraction, respectively).

© EDP Sciences 2003