J. Phys. IV France 11 (2001) Pr11-233-Pr11-237
Scale up of a single source MOCVD system for deposition of YBCO onto travelling tapesO. Stadel1, J. Schmidt1, G. Wahl1, F. Weiss2, D. Selbmann3, J. Eickemeyer3, O.Yu. Gorbenko4, A.R. Kaul4 and C. Jimenez
1 Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung (IOPW), Technische Universität Braunschweig, Germany
2 Laboratoire des Matériaux et du Génie Physique (LMPG), ENSPG, Grenoble, France
3 Institut für Festkörper und Werkstofforschung Dresden (IFW), Germany
4 Department of Chemistry
MOCVD is a promising economic method for the production of YBCO tapes. An enlarged single source MOCVD-system for continuous deposition of YBCO on metal tapes was developed. Computer simulations with FLUENT code were used for the design of the new tape system, which is based on a former small tape system. The calculated temperature distribution, precursor mole fractions and gas flows lead to a better understanding of the important aspects of the design. In this new system single crystals, IBAD buffered tapes and buffered textured Ni-tapes were transported through the deposition zone and coated with YBCO. On Single crystals, IBAD buffered substrates and textured Ni the best critical current densities at 77 K of the 300-500 nm thick YBCO films were 4.8 MA/cm2, 2.5 MA/cm2 and 0.25 MA/cm2 respectively. The velocity for the tape transport was 4 m/h for these substrates. The XRD-measurements of the YBCO-film on single crystalline LaAlO3 showed only c-axis orientation with FWHM(OO5) = 0.10° for the rocking curve and with FWHM(102) = 0.7° for the phi scan.
© EDP Sciences 2001