J. Phys. IV France
Volume 11, Numéro PR2, Juillet 2001
X-Ray Lasers 2000
Page(s) Pr2-417 - Pr2-420
7th International Conference on X-Ray Lasers

J. Phys. IV France 11 (2001) Pr2-417-Pr2-420

DOI: 10.1051/jp4:2001280

Dynamics of the EUV radiation in a fast micro-capillary plasma discharge source

T.N. Hansen1, I. Krisch2, P. Choi3, J. Larour3, J.G. Lunney1, J. Castro1, A. Engel3, A. Guilbert4 and J. Rous3

1  Department of Physics, Trinity College Dublin, Dublin 2, Ireland
2  John Caunt Scientific Ltd., Oxford OX2 6YE, U.K.
3  Laboratoire de Physique des Milieux Ionisés, UMR 7648 du CNRS, École Polytechnique, 91128 Palaiseau, France
4  EPPRA, XTEC, École Polytechnique, 91128 Palaiseau, France

An ultra-fast micro-capillary plasma discharge is used to generate a hot plasma that acts as a source of high brightness EUV radiation. The discharge proceeds by a dielectric surface self-breakdown in vacuum through a preformed sub-millimetre hole in the dielectric sheet separating two circular parallel electrodes. This geometrical constriction increases the reproducibility and pins the plasma during its early development. Time resolved spectroscopic measurements were used to characterise the radiation in the 10 - 30 nm region.

© EDP Sciences 2001