J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
Page(s) Pr8-365 - Pr8-371
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition

J. Phys. IV France 09 (1999) Pr8-365-Pr8-371

DOI: 10.1051/jp4:1999845

Microstructure and properties of nanocomposite diamond films obtained by a new CVD-based technique

M.L. Terranova1, S. Piccirillo1, V. Sessa1, M. Rossi2 and S. Botti3

1  Dipartimento di Scienze e Tecnologie Chimiche and INSTM, Università Tor Vergata, Via della Ricerca Scientifica, 00133 Roma, Italy
2  Dipartimento di Energetica, Università La Sapienza, and INFM, UdR RM1, via A. Scarpa 16, 00161 Roma, Italy
3  ENEA, Dipartimento Innovazione, Divisione Fisica Applicata, CR Frascati, P.O. Box 65, 00044 Frascati, Italy

a new hybrid CVD-powder flowing technique has been adopted in order to grow diamond-based composite materials in form of thin films, coatings and free-standing layers. We report details of the synthesis procedure that allows to control incorporation of nanometer-sized powdered species (metals and semiconductors) in form of aggregates, clusters or nanosized dispersions inside a polycrystalline diamond matrix. The focus is on microstructure and actual properties (electrical, optical) connected with the deposition procedure of some representative nanocomposite layers. The electrical behaviour of Nd-containing diamond films and the room-temperature emission in the 2.0-2.4 eV region by the Si-containing films are reported and discussed.

© EDP Sciences 1999