J. Phys. IV France 06 (1996) C7-189-C7-195
Effects of a Simultaneous Bombardment with Ions of Low Energy on the Growth and Microstructure of Ag/Ni MultilayersC. Minault1, C. Jaouen2, F. Tamisier2, J. Allain2 and Ph. Guérin2
1 Present address : J.J. Thomson Physical Laboratory, University of Reading, Berkshire, U.K.
2 Laboratoire de Métallurgie Physique, UA 131 du CNRS, Université de Poitiers, SP2MI, BP. 179, 86960 Futuroscope cedex, France
The effect of argon ion bombardment on the structure and properties of nickel and silver films was studied as a function of the energy in a very low energy range 0-300 eV. The effect of ion irradiation on the structure of the nickel films appears very different at high energy (E>100 eV) as opposed to 25-75 eV. The microstructure looks to result from an interplay between different mechanisms related to surface and bulk damage varying across the energy range. The first results of a study concerned with the elaboration and characterization of Ag/Ni multilayers (composition modulation Λ=82Å) deposited under Ar-ion irradiation are reported and compared with those obtained by Ion Beam Sputtering without ion assistance. X-ray diffraction scans show that coherent multilayers are obtained in both cases. The analysis of the profiles shows that the structural intralayer parameters are unchanged. On the other hand, a strong enhancement of the texture under ion irradiation is clearly shown but with a substantial decrease of the coherency length.
© EDP Sciences 1996