J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
Page(s) C5-809 - C5-814
Proceedings of the Tenth European Conference on Chemical Vapour Deposition

J. Phys. IV France 05 (1995) C5-809-C5-814

DOI: 10.1051/jphyscol:1995596

Optimization of the Deposition Conditions of Titanium Nitride from Ammonia and Titanium Tetrachloride

M. Nadal and F. Teyssandier

Institut de Science et de Génie des Matériaux et Procédés, UPR 8521 du CNRS, Université, Av. de Villeneuve, 66860 Perpignan cedex, France

TiN has been used in numerous technological applications including : cutting or milling tools and inserts, cold extrusion nozzles and punches, forming or stamping tools, and diffusion barrier. It is currently deposited from an initial gas mixture composed of hydrogen, ammonia and titanium tetrachloride. This paper reports on the optimization of its deposition conditions at atmospheric pressure. A complete factorial design with three factors and two levels, thus requiring 23=8 experiments, has been carried out. The following parameters were selected : the deposition temperature, the molar fraction of titanium tetrachloride and the molar fraction of ammonia. The influence of these factors on the deposition rate, the grain size estimated by the Scherrer method and the texture coefficient as determined by X-ray diffraction were studied. The mechanical properties of the coatings (microhardness, Young's modulus) were measured by depth-sensing indentation.

© EDP Sciences 1995