EDP Sciences Journals List
Issue J. Phys. IV France
Volume 104, March 2003
Page(s) 189 - 192
DOI http://dx.doi.org/10.1051/jp4:200300058

J. Phys. IV France
104 (2003) 189
DOI: 10.1051/jp4:200300058

Sputtered-sliced fabrication of kinoform zone plate for hard X-ray focusing

M. Yasumoto1, 2, S. Tamura3, 2, N. Kamijo4, 2, Y. Suzuki2, M. Awaji2, A. Takeuchi2 and H. Takano2

1  Photonics Research Institute, AIST, AIST Tsukuba Central 2, Tsukuba 305-8568, Japan
2  Japan Synchrotron Radiation Research Institute (SPring-8), Mikazuki-cho, Hyogo 679-5198, Japan
3  Photonics Research Instffute, AIST, AIST Kansai, Ikeda, Osaka 563-8577, Japan
4  Kansai Medical University, Uyama-higashi, Hirakata, Osaka 573-1136, Japan

We are planning to develop a kinoform zone plate (ZP) for hard X-ray using a sputtered-sliced (SS) method with two materials (Cu/Al). The SS kinoform ZP is composed of a Cu/Al multilayer that is based on radial modulation of the refractive indices of deposition materials. The X-ray through the zones interferes constructively at the focal point. The kinoform ZP, therefore, has an advantage of high focusing efficiency. According to the our theoretical calculation, the focusing efficiency of the Cu/Al kinoform PZP is up to 86% in the 0~30 keV X-ray energy region, while one of the conventional Cu/Al multilayer Fresnel zone plate is up to 38%.

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