Numéro |
J. Phys. IV France
Volume 09, Numéro PR10, December 1999
International Workshop on Electronic CrystalsECRYS-99 |
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Page(s) | Pr10-175 - Pr10-177 | |
DOI | https://doi.org/10.1051/jp4:19991044 |
ECRYS-99
J. Phys. IV France 09 (1999) Pr10-175-Pr10-177
DOI: 10.1051/jp4:19991044
Nano-fabrication of CDW and its negative resistance phenomenon
H. Kubota1, T. Sumita1, S. Takami1, T. Shinada2 and I. Ohdomari21 Department of Electrical Engineering and Computer Science, Kumamoto University, Kurokami 2-39-1, Kumamoto 860-8555, Japan
2 Waseda University, Tokyo, Japan
Abstract
Nano-fabrication of CDW (nano-CDW) with sub 0.1 micrometer thick has been successfully formed by applying of focused-ion-beam to the one-dimensional conductor, molybdenum blue bronze (K0.3MoO3) crystal. The nano-CDW characteristically shows negative resistance above the threshold fields, which monotonously increased with decreasing temperature. The nano-fabrication is completed via two steps procedure. 1 st : Hydrogen ion beam irradiation to the K0.3MoO3 crystal makes no-CDW layer by hydrogen atoms as excess-donar at 40-100 nm depth, where CDW at the surface of the crystal was isolated from the bulk side. 2 nd : Scanning focused silicon ion beam makes amorphous MoO3 in line and space patterns, where CDW at the surface are isolated as real one-dimensional region. The one-dimensionality of electrons has been confirmed by negative magnetic resistance, which magnitude should be reduced with decreasing dimensionality.
© EDP Sciences 1999