Numéro |
J. Phys. IV France
Volume 06, Numéro C3, Avril 1996
WOLTE 2Proceedings of the Second European Workshop on Low Temperature Electronics |
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Page(s) | C3-125 - C3-129 | |
DOI | https://doi.org/10.1051/jp4:1996319 |
Proceedings of the Second European Workshop on Low Temperature Electronics
J. Phys. IV France 06 (1996) C3-125-C3-129
DOI: 10.1051/jp4:1996319
Optimization of Early Voltage for Cooled SiGe HBT Precision Current Sources
A.J. Joseph, J.D. Cressler and D.M. RicheyElectrical Engineering Department, 200 Broun Hall, Auburn University, Auburn, AL 36849-5201, U.S.A.
Abstract
The influence of Ge profile shape on the temperature characteristics of two key analog transistor parameters, Early voltage (VA) and current gain-Early voltage product (βVA), in SiGe HBTs have been studied over the temperature range of 300K-77K using SCORPIO, a transistor simulation tool calibrated to measured data [1]. A new version of SPICE that accounts for the temperature dependence of VA was used to model the various SiGe HBTs simulated and thereby evaluate the cryogenic performance of SiGe HBT precision current sources, which are strongly influenced by the variations in both β and VA. Results clearly indicate that the cryogenic performance of these SiGe current sources can be significantly improved by using a graded Ge profile instead of a constant Ge profile in the base region of the HBT.
© EDP Sciences 1996