Journal de Physique IV

Low Temperature Deposition of TiN Ceramic Material by Metal Organic and/or Plasma Enhanced CVD

C.I.M.A. Spee, J.P.A.M. Driessen and A.D. Kuypers

J. Phys. IV France, 05 C5 (1995) C5-719-C5-734

DOI: 10.1051/jphyscol:1995587

C.I.M.A. Spee

J.P.A.M. Driessen

A.D. Kuypers

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