Journal de Physique IV

Investigation of the Substrate/Epitaxial Interface of Si/Si_1-xGe_x Layers Grown by LPCVD

R. Loo, L. Vescan, C. Dieker, D. Freundt, A. Hartmann and A. Mück

J. Phys. IV France, 05 C5 (1995) C5-895-C5-903

DOI: 10.1051/jphyscol:19955106

R. Loo

L. Vescan

C. Dieker

D. Freundt

A. Hartmann

A. Mück

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)