Journal de Physique IV

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Photo-CVD deposited TiO₂ films studied by Raman and XPS spectroscopy

J.Y. Zhang, Q. Fang, J.X. Wu, C.Y. Xu, B.J. O'Sullivan, P.K. Hurley, T.L. Leedham, M.A Audier, J.P. Sénateur and I.W. Boyd

J. Phys. IV France, 11 PR11 (2001) Pr11-295-Pr11-299

DOI: 10.1051/jp4:20011148

J.Y. Zhang

Q. Fang

J.X. Wu

C.Y. Xu

B.J. O'Sullivan

P.K. Hurley

T.L. Leedham

M.A Audier

J.P. Sénateur

I.W. Boyd

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Copyright / Publiée par : EDP Sciences