Journal de Physique IV

Chloride atomic-layer chemical vapor deposition of TiO₂ with a chloride pretreatment of substrates

A. Niilisk, A. Rosental, T. Uustare, A. Kasikov and A. Tarre

J. Phys. IV France, 11 PR11 (2001) Pr11-103-Pr11-107

DOI: 10.1051/jp4:20011116

A. Niilisk

A. Rosental

T. Uustare

A. Kasikov

A. Tarre

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