Journal de Physique IV

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XPS study of CVD silicon thin films deposited on various substrates from SiH₄ gaseous precursor

R. Berjoan, D. Perarnau and B. Caussat

J. Phys. IV France, 09 PR8 (1999) Pr8-1139-Pr8-1145

DOI: 10.1051/jp4:19998142

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