Journal de Physique IV

Experimental and chemical kinetic study of silicon nitride via LPCVD at low temperature from disilane and ammonia

R. HENDA, E. SCHEID, L.K. KOUASSI, J. SAMITIER and A. EL HASSANI

J. Phys. IV France, 03 C3 (1993) C3-395-C3-402

DOI: 10.1051/jp4:1993355

R. HENDA

E. SCHEID

L.K. KOUASSI

J. SAMITIER

A. EL HASSANI

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