Journal de Physique IV

LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILICON NITRIDE

H. KANOH, O. SUGIURA, S. FUJIOKA, Y. ARAMAKI, T. HATTORI and M. MATSUMURA

J. Phys. IV France, 02 C2 (1991) C2-831-C2-837

DOI: 10.1051/jp4:1991298

H. KANOH

O. SUGIURA

S. FUJIOKA

Y. ARAMAKI

T. HATTORI

M. MATSUMURA

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