SiCN Amorphous Materials Chemical Vapour Deposited Using the Si(CH3)4-NH3-H2 System A. Bendeddouche, R. Berjoan, E. Bêche, S. Schamm, V. Serin, R. Carles et R. HillelJ. Phys. IV France, 05 C5 (1995) C5-793-C5-800DOI: https://doi.org/10.1051/jphyscol:1995594
