Room temperature SiO2 films deposited by multipolar ECR PECVD G. Isai, A. Kovalgin, J. Holleman, P. Woerlee et H. WallingaJ. Phys. IV France, 11 PR3 (2001) Pr3-747-Pr3-753DOI: https://doi.org/10.1051/jp4:2001394
