Fundamental studies on the decomposition mechanism of Ti(OC3H7)4 and TiO2 film evolution on Si(100) and Pt(100) surfaces S.-I. Cho, S. H. Moon et C.-H. ChungJ. Phys. IV France, 11 PR3 (2001) Pr3-517-Pr3-524DOI: https://doi.org/10.1051/jp4:2001365
